XPS STUDY OF Rh/In2O3 SYSTEM

Korotcenkov, Ghenadii; Brinzari, Vladimir; Nehasil, Vaclav

dc.contributor.author	Korotcenkov, Ghenadii
dc.contributor.author	Brinzari, Vladimir
dc.contributor.author	Nehasil, Vaclav
dc.date.accessioned	2022-02-23T10:58:18Z
dc.date.available	2022-02-23T10:58:18Z
dc.date.issued	2021
dc.identifier.citation	KOROTCHENKOV, G., BRINZARI, V., NEHASIL, Vaclav. XPS study of Rh/In2O3 system. In: Surfaces and Interfaces. 2021, nr. 22, p. 0. ISSN 2468-0230.	en
dc.identifier.issn	2468-0230
dc.identifier.uri	https://doi.org/10.1016/j.surfin.2020.100794
dc.identifier.uri	http://dspace.usm.md:8080/xmlui/handle/123456789/5716
dc.description.abstract	The effect of surface modification of In2O3 films by rhodium atoms deposited by electron beam sputtering on the XP spectra is considered. The surface coverage with rhodium ranged from 0 to 0.1 ML. It was shown that the main changes in the XP spectra occur in the Rh3d region and are caused by the dimensional effect of rhodium particles. With an increase in the surface coverage with rhodium, Rh particles grow from an atomically dispersed state to relatively large clusters. As the particle size increases, its electronic structure tends to approach the state corresponding to the bulk Rh. Such a process is accompanied by a decrease in BE Rh3d5/2 by 0.3–0.6 eV, which behaviour depends on the surface structure of the used In2O3 films.	en
dc.language.iso	en	en
dc.publisher	Elsevier	en
dc.subject	surface	en
dc.subject	characterisation	en
dc.subject	atomic dispersion	en
dc.subject	clustering	en
dc.subject	binding energy	en
dc.subject	electron beam evaporation	en
dc.title	XPS STUDY OF Rh/In2O3 SYSTEM	en
dc.type	Article	en