XPS STUDY OF THE SnO2 FILMS MODIFIED WITH Rh

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dc.contributor.author Korotcenkov, Ghenadii
dc.contributor.author Brinzari, Vladimir
dc.contributor.author Hanyš, P.
dc.contributor.author Nehasil, V.
dc.date.accessioned 2021-04-15T10:04:16Z
dc.date.available 2021-04-15T10:04:16Z
dc.date.issued 2018
dc.identifier.citation KOROTCENKOV, G., BRINZARI, V. et al. XPS study of the SnO2 films modified with Rh . In: Surface and Interface Analysis. 2018, Vol. 50. Issue 5, pp. 795 - 801. ISSN 0142-2421. en
dc.identifier.issn 0142-2421
dc.identifier.uri https://orcid.org/0000-0002-3973-9051
dc.identifier.uri https://analyticalsciencejournals.onlinelibrary.wiley.com/doi/abs/10.1002/sia.6476
dc.identifier.uri http://dspace.usm.md:8080/xmlui/handle/123456789/4145
dc.description.abstract In this paper, we have analyzed the effect of the rhodium surface modification on the surface state of SnO2 films. SnO2 films, subjected for the surface modification, were deposited by spray pyrolysis, while Rh was deposited by using a microelectron beam evaporation. The thickness of the Rh coating varied in the range 0 to 0.1 monolayer. An explanation of the observed effects was proposed. Basing on the results of X‐ray photoelectron spectroscopy, it was assumed that at a small thickness of the rhodium covering, Rh was in a the well‐dispersed state, close to atomically dispersed state. The growth in the size of the nanoparticles began mainly when the thickness of the Rh covering exceeeded 0.01 monolayer. The size of clusters did not exceed 0.5 to 1.0 nm. en
dc.language.iso en en
dc.publisher John Wiley and Sons en
dc.title XPS STUDY OF THE SnO2 FILMS MODIFIED WITH Rh en
dc.type Article en


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